| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for forming patterns of the microphase separation structure having a fine domain size at a level of about 10 nm or smaller by using a block copolymer or a graft copolymer readily soluble in the solvent and easily applicable to the substrate or the like. SOLUTION: The objective process for forming patterns of the microphase separation structure comprises the step where a block copolymer or a graft copolymer of which at least one of the polymer chains bears salt-forming groups selected from acidic groups and basic groups is formed into molded bodies, the step where the salt-forming group is converted to a salt, and the step where the microphase separation structure is formed in the block or graft copolymer, or the microphase separation structure formed on the block or graft copolymer is changed.
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