METHOD FOR FORMING POROUS LAYER OF IMPLANT SURFACE

摘要

PURPOSE: A method for forming a porous layer on the surface of an implant is provided to enable the process thereof to be performed at a relatively low temperature, and to simplify the process of manufacture by eliminating an adding step of alloy component powder. CONSTITUTION: The method for forming a porous layer on the surface of an implant made of titanium is comprised of steps of; forming a bead coating layer by applying a mixture of titanium or titanium alloy bead, a silicon based compound, and a binder to the surface of the implant; preliminarily sintering the implant in a vacuum condition; and repeatedly sintering the implant in the vacuum condition after the completion of the preliminary sintering step.