APPARATUS FOR PREVENTING DAMAGE OF CHUCK IN SEMICONDUCTOR FABRICATION EQUIPMENT

摘要

PURPOSE: An apparatus for preventing a damage of a chuck in semiconductor fabrication equipment is provided to prevent the damage of an ESC chuck by preheating Ar gas in a reflow process. CONSTITUTION: An MFC(Mass Flow Controller)(10) controls a pressure of Ar gas and provides the Ar gas to a preheat unit(12). The preheat unit(12) preheats the Ar gas supplied from the preheat unit(12) and provides the Ar gas to a chamber(20). A wafer(24) is loaded on an upper portion of an ESC chuck(22). The ESC chuck(22) is formed with a ceramic material. The ESC chuck(22) has an inner heater(26) and an outer heater(28). The ESC chuck(22) and the wafer(24) are formed in the chamber(20). The heat generated from the inner heater(26) and the outer heater(28) is transferred to the wafer(24) by the Ar gas.