NEW OXIME SULFONATES AND THE USE THEREOF AS LATENT SULFONIC ACIDS

摘要

New oximsulfonate compounds of the formulae I or II, wherein m is 0 or 1; x is 1 or 2; R1 is, for example phenyl, which is unsubstituted or substituted or R1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R1 additionally is C2-C6alkoxycarbonyl, phenoxycarbonyl or CN; R'1 is for example C2-C12alkylene, phenylene; R2 has for example one of the meanings of R1; n is 1 or 2; R3 is for example C1-C18alkyl, R'3 when x is 1, has one of the meanings given for R3, or R'3 in the formula IV and when x is 2 in the formula 1, is for example C2-C12alkylene, phenylene; R4 and R5 are independently of each other for example hydrogen, halogen, C1-C6alkyl; R6 is for example hydrogen, phenyl; R7 and R8 are independently of each other for example hydrogen or C1-C12-alkyl; R9 is for example C1-C12 alkyl; A is S, O, NR6, or a group of formula A1, A2, A3 or A4 R10 and R11 independently of each other have one of the meanings given for R4; R12, R13, R14 and R15 independently of one another are for example hydrogen, C1-C4alkyl; Z is CR11 or N; Z1 is -CH2-, S, O or NR6, are useful as latent sulfonic acids, especially in photoresist applications.