METHOD FOR MANUFACTURING INK JET HEAD

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an ink jet head in which a diaphragm to be formed by an etching stop technique is formed highly accurately up to a sub micrometer thickness. SOLUTION: A boron dope layer 4 is formed to a Dope face of an Si substrate 1 under conditions of a diffusion temperature of 1025-1200 deg.C and a diffusion time of 0.5 hr or shorter. SiO2 films 5a are formed to both faces of the Si substrate 1 at a low temperature. The SiO2 film 5 formed to a Cav face 2 of the Si substrate 1 is patterned, and thereafter the boron dope layer 4 is formed by the etching stop technique as the diaphragm 4a.