| 摘要 |
PROBLEM TO BE SOLVED: To provide a direct patterning method. SOLUTION: The surface of a resin substrate is subjected to ion exchange group introducing treatment. The surface of the resin substrate is treated with a metallic ion-containing solution, and metallic ions are introduced therein. After that, a photocatalyst is introduced into the resin substrate, and the resin substrate is irradiated with an electromagnetic beam, so that a composite material in which the surface of the resin substrate is provided with the metal is provided. The composite material is useful as the one requiring a finer metallic pattern.
|
