FOCUSING APPARATUS IN ION IMPLANTATION EQUIPMENT OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A focusing apparatus in ion implantation equipment of a semiconductor device is provided to reduce a manufacturing cost of the semiconductor device by exchanging and mending each component without disassembling equipment. CONSTITUTION: A plurality of accelerators(24a,24b) are installed on a transferring path within a tandetron chamber(22). A stripper(26) having a shape of a tube is installed on the transferring path between the accelerators(24a,24b). An end portion of a supply tube(40a) is connected with one side of the stripper(26). A needle valve(30) is installed on the supply tube(40a). The needle valve(30) is used for controlling the amount of nitrogen gas supplied to an inside of the stripper(26). A connection tubes(42a) is connected with the other side of the stripper(26). A turbo pump(32) is installed on the connection tube(42a) in order to provide a predetermined vacuum pressure. A valve(44) is installed on the supply tube(40a).