APPARATUS AND METHOD FOR CLEANING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus in which a cleaning liquid supplied to a substrate is prevented from staying particularly on the top surface of the substrate. SOLUTION: This substrate cleaning apparatus is provided with a conveying mechanism 2 for conveying the substrate 1 to the prescribed direction, cleaning means 21, 22 each of which has the upper cleaning brush 23 and the lower cleaning brush 24 disposed oppositely in the vertical direction for cleaning the top and under surfaces of the substrate 1 conveyed by the mechanism 2 by the brushes 23 and 24 and a nozzle body 41 disposed on the upstream or/and downstream sides of the means 21, 22 for supplying liquid to at lest the top surface of the substrate 1 to be cleaned by the means 21, 22 at the prescribed angle of inclination with respect to the direction intersecting the substrate conveying direction.