ELECTROCONDUCTIVE LAYERS

摘要

1301661 Electroconductive copolymers AGFA-GEVAERT 13 Jan 1970 [29 Jan 1969] 4946/69 Heading C3P [Also in Divisions B2 G2 and H1] Copolymers having a surface resistivity lower than 1011 ohm/sq. comprise (A) 20 to 95 mole per cent of ionic monomers conferring electroconductivity on the copolymers and (B) 5 to 80 mole per cent of monomers carrying halogen atoms reactive with at least some of the monomers (A), the copolymers being water-soluble and being capable of cross-linking on heating at 30-180‹ C. The ionic monomers may be cationic, e.g. ammonium or sulphonium salts, or anionic, e.g. alkali metal and ammonium carboxylates and sulphonic and phosphonic acids and salts. The halogen-containing monomers may be vinylbenzyl chlorides, chloracrylic acid, haloalkyl acrylates and methacrylates and vinyl haloacetates. The monomers (C) may be alkali metal and ammonium carboxylates and sulphonic and phosphonic acids and salts. The copolymers are useful in antistatic layers in photographic materials and conductive layers in electrographic and electrophotographic materials. Many suitable monomers are specified and examples describe the preparation of copolymers of (1 and 2) N-acryloyloxyethyl pyridinium chloride, chlorethyl acrylate and sodium acrylate by polymerizing chlorethyl acrylate, quaternizing with pyridine and neutralizing with NaOH; (3 and 4) N-acryloyloxyethyl pyridinium chloride, chlorethyl acrylate and acrylic acid pyridine salt by copolymerizing chlorethyl acrylate and quaternizing and neutralizing with pyridine; (5 and 6) 1,2-dimethyl- 5-vinylpyridinium methylsulphate, chlorethyl acrylate and sodium acrylate by copolymerizing the pyridinium compound, acrylate and acrylic acid and neutralizing with NaOH; (7-13) vinylbenzyl trimethyl ammonium chloride, vinylbenzyl chloride and sodium acrylate by eopolymerizing vinyl toluene and acrylic acid, chlorinating, quaternizing with trimethylamine and neutralizing with NaOH; (14-17) N-acryloyloxyethyl trimethyl ammonium chloride, chlorethyl acrylate and sodium acrylate by copolymerizing chlorethyl acrylate and acrylic acid, quaternizing with trimethylamine and neutralizing with NaOH; (18) N-methacryloyloxyethyl trimethyl ammonium methylsulphate, chlorethyl acrylate and sodium acrylate by copolymerizing the ammonium compound, acrylate and acrylic acid and neutralizing with NaOH; (19) N-mothacryloyloxyethyl diethylammonium chloride, chlorethyl acrylate and sodium acrylate by copolymerizing diethylaminoethyl methacrylate hydrochloride, chlorethyl acrylate and acrylic acid and neutralizing with NaOH; (20 and 21) chlorethyl acrylate and sodium acrylate by neutralizing the acrylic acid copolymer with NaOH; (22) trimethylammonium salt of styrene sulphonic acid, chlorethyl acrylate and acrylic acid salt by copolymerizing styrene, chlorethyl acrylate and acrylic acid, sulphonating and quaternizing and neutralizing with trimethylamine ; (23 and 24) sodium sulphopropyl acrylate, chlorethyl acrylate and sodium acrylate; (25) sodium sulphopropyl acrylate, chlorethyl acrylate, styrene and sodium acrylate and (26) sodium sulphopropyl methacrylate, chlorethyl acrylate, sodium acrylate and methacrylate by reacting the chlorethyl acrylate/acid copolymers with propane sultone and neutralizing with NaOH; and (27 and 28) styrene, chlorethyl acrylate and sodium maleate by copolymerizing styrene, acrylate and maleic anhydride and reacting with NaOH. Further examples describe coating compositions comprising these copolymers.