| 摘要 |
chemical vapor deposition; units for deposition of gaseous metal carbonyls on backing; mechanical engineering and metallurgy. SUBSTANCE: bedplate 12 and cover 14 of unit 10 form reaction chamber 20. Ring 28 of mandrel 36 is located in bedplate 12 ; it is isolated from bedplate supporting mandrel 36. Ring 28 has at least one liquid passage and is adapted to receive matrix. Unit 10 is provided with device 22 for introducing gaseous carbonyl into chamber. Liquid heat-transfer agent passes to mandrel 36 through ring 28, thus making it possible to keep mandrel 36 at preset temperature to ensure thermal decomposition. EFFECT: avoidance of contamination of silicone gaskets of large surface, leakage of liquid heat-transfer agent and leakage of metal carbonyl into lower chamber. 10 cl, 6 dwg
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