发明名称 |
HIGHLY PURE STANDARD PARTICLE FORMER AND HIGHLY PURE STANDARD PARTICLE MADE THEREBY |
摘要 |
PROBLEM TO BE SOLVED: To provide a former that efficiently forms nanometer-size highly pure standard particles having a monodisperse uniform structure and being in the state alleviated in contamination and damage from a material which can be selected from a wide variety of materials and to provide highly pure standard particles. SOLUTION: This former is constituted by using a particle formation chamber 101 that forms highly pure particles by exciting a semiconductor target with pulse laser beams 109 in a low-pressure rare gas atmosphere, thereby subjecting the target to an abrasion reaction for release and injection and condensing and growing the released and injected matter in air, a chamber 102 that classifies the highly pure particles, and a chamber 103 that collects the highly pure standard particles on a substrate.
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申请公布号 |
JP2002239377(A) |
申请公布日期 |
2002.08.27 |
申请号 |
JP20010037736 |
申请日期 |
2001.02.14 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
SUZUKI NOBUYASU;YOSHIDA TAKEHITO;MAKINO TOSHIHARU;YAMADA YUKA |
分类号 |
B03C7/02;B01J19/12;B22F9/02;C23C14/00;C23C14/28;G01N15/06;H01L21/203;(IPC1-7):B01J19/12 |
主分类号 |
B03C7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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