发明名称 HIGHLY PURE STANDARD PARTICLE FORMER AND HIGHLY PURE STANDARD PARTICLE MADE THEREBY
摘要 PROBLEM TO BE SOLVED: To provide a former that efficiently forms nanometer-size highly pure standard particles having a monodisperse uniform structure and being in the state alleviated in contamination and damage from a material which can be selected from a wide variety of materials and to provide highly pure standard particles. SOLUTION: This former is constituted by using a particle formation chamber 101 that forms highly pure particles by exciting a semiconductor target with pulse laser beams 109 in a low-pressure rare gas atmosphere, thereby subjecting the target to an abrasion reaction for release and injection and condensing and growing the released and injected matter in air, a chamber 102 that classifies the highly pure particles, and a chamber 103 that collects the highly pure standard particles on a substrate.
申请公布号 JP2002239377(A) 申请公布日期 2002.08.27
申请号 JP20010037736 申请日期 2001.02.14
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SUZUKI NOBUYASU;YOSHIDA TAKEHITO;MAKINO TOSHIHARU;YAMADA YUKA
分类号 B03C7/02;B01J19/12;B22F9/02;C23C14/00;C23C14/28;G01N15/06;H01L21/203;(IPC1-7):B01J19/12 主分类号 B03C7/02
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