发明名称 |
FILM FORMATION METHOD AND FILM FORMATION APPARATUS |
摘要 |
PURPOSE: A film formation method and a film formation apparatus are provided to achieve improved carrier mobility by moderating the energy barrier existing in an organic compound layer. CONSTITUTION: A film formation method comprises a first step of forming a first function region(306) comprising a first organic compound on an electrode during irradiating a light in a film formation chamber(301), a second step of forming a mixed region including the first organic compound and a second organic compound(303b) on the first function region during irradiating the light in the film formation chamber, and a third step of forming a second function region(307) including the second organic compound on the mixed region during irradiating the light in the film formation chamber.
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申请公布号 |
KR20020068469(A) |
申请公布日期 |
2002.08.27 |
申请号 |
KR20020009200 |
申请日期 |
2002.02.21 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY K.K. |
发明人 |
SEO SATOSHI;SHIBATA NORIKO;YAMAZAKI SHUNPEI |
分类号 |
H05B33/10;C23C14/02;C23C14/12;C23C14/24;C23C14/56;H01L51/00;H01L51/30;H01L51/40;H01L51/50;(IPC1-7):H05B33/10 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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