发明名称 Substrate processing apparatus and substrate processing method
摘要 A substrate processing apparatus comprises a processing section for performing processing for a substrate, a substrate carrier transfer section into/out of which a substrate carrier holding a plurality of substrates is carried, and a substrate transfer mechanism for taking an unprocessed substrate out of the substrate carrier carried into the substrate carrier transfer section to deliver it to the processing section and for receiving a processed substrate from the processing section to deliver it into the substrate carrier placed on the substrate carrier transfer section. The substrate carrier transfer section shifts the position of the substrate carrier between a first position at which the substrate carrier is carried to/from the outside and a second position at which the substrate in the substrate carrier is delivered to/from the substrate transfer mechanism.
申请公布号 US6439822(B1) 申请公布日期 2002.08.27
申请号 US19990401486 申请日期 1999.09.22
申请人 TOKYO ELECTRON LIMITED 发明人 KIMURA YOSHIO;UEDA ISSEI;MATSUSHITA MITIAKI;ITO KAZUHIKO
分类号 H01L21/68;B65G49/07;H01L21/677;(IPC1-7):B65G1/10 主分类号 H01L21/68
代理机构 代理人
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