发明名称 NITRIDE SEMICONDUCTOR LASER DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a nitride semiconductor laser device which prevents FFP(far field pattern) in the horizontal direction from ripples to lie on, in the case of high output operation. SOLUTION: In a nitride semiconductor laser device of an effective refractive index type provided with a ridge, the first insulation film, having a value smaller than the refractive index of a waveguide region is formed in the neighborhood of and on the side surface of the ridge on an exposed surface exposed by etching and the second insulation film, having a value larger than the refractive index of the waveguide region is formed on the exposed surface away from the ridge and on a side surface different from the surface of an oscillator in the waveguide region. The second insulating film consisting of metal or a semiconductor may have a value larger than the refractive index of the waveguide region.
申请公布号 JP2002237661(A) 申请公布日期 2002.08.23
申请号 JP20010374589 申请日期 2001.12.07
申请人 NICHIA CHEM IND LTD 发明人 NAGAHAMA SHINICHI;SANO MASAHIKO;YANAGIMOTO TOMOYA;MATSUYAMA YUJI;KAWADA YASUHIRO
分类号 H01L21/314;H01L21/316;H01S5/323;H01S5/343;(IPC1-7):H01S5/343 主分类号 H01L21/314
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