LOW FREQUENCY INDUCTION TYPE HIGH FREQUENCY PLASMA REACTOR

摘要

PROBLEM TO BE SOLVED: To provide a plasma reactor suitable to soft etching treatment advantageous in supplying more electric power to ion generation than free radical generation. SOLUTION: The plasma reactor comprises a high frequency power supply (43) inductively coupled to a reaction chamber to generate a high frequency magnetic field approximately vertical to a stand on which a wafer is mounted when treatment is conducted. The reactor comprises an induction coil (42) for inductively supplying high frequency power to the reaction chamber and a split Faraday shield (45) arranged between the induction coil (42) and the reaction chamber. The split Faraday shield includes a plurality of approximately nonconductive gaps (48) for inductively supplying the high frequency power through the split Faraday shield to continue plasma.