| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a stencil multilayer mask that can withstand the application of high-acceleration electron beams and allows a gap to be formed at a mask layer so that an accurate and thin pattern can be formed with a thick resist. SOLUTION: The stencil multilayer mask comprises a stencil section for absorbing heat than can cope with an exposure light source or the like that is a high-acceleration electron beam for sensitizing charged particles by strong X rays such as SOR light and an electron beam that is a charged particle and an ion beam, and a stencil for forming a pattern. The stencil multilayer mask having each layer configuration coping with the exposure light source comprises a pattern opening 31, a pattern 32, a gap 61, an electrical connection means 41 for preventing electrification, a through hole 33 for burying a conductive material, and a frame 51 that can be fixed to a projection aligner easily.</p> |
