| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type negative type resist composition excellent in sensitivity and resolving power when electron beams or X-rays are used, having rectangular profile and ensuring reduced roughness and a reduced number of particles in a resist solution. SOLUTION: The chemical amplification type negative type resist composition contains an alkali-soluble resin, an acid generating agent, a crosslinker which causes crosslinking under an acid, an organic basic compound and an organic solvent. The crosslinker is a phenol derivative containing 3-10 atomic groups having a benzene ring in one molecule and the molecular weight is <=2,000. The derivative has one or more hydroxymethyl groups and one or more alkoxymethyl groups in one molecule and these groups bond to at least one of the benzene ring forming atomic groups. |
