| 摘要 |
PURPOSE: A method and system for evaluating polysilicon, and a method and system for fabricating thin film transistor are provided to evaluate a state of a polysilicon film objectively, accurately, automatically, and in a non-contact manner. CONSTITUTION: The polysilicon evaluating method includes (a) picking up a surface of a polysilicon film formed by excimer laser annealing, (b) dividing the picked-up image into meshes each having a specific size, (c) calculating a contrast in each of the meshes, (d) extracting a highest contrast value and a lowest contrast value in the picked-up image, (e) calculating a contrast ratio therebetween, and (f) judging an average grain size of the polysilicon film on the basis of the contrast ratio.
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