PLASMA TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To conduct plasma uniform treatment by reducing an impedance difference among a plurality of treatment chambers. SOLUTION: A connection between a conductor 7 of a holding section 3a and a conductor 7 of a holding section 3c makes a strip electrode 11 and a strip electrode 13 have equal electric potentials. In other words, the strip electrode 11 and the strip electrode 13 constitute a first electrode. A high frequency is applied to each strip electrode 11 and 11 from a single high frequency power supply 17 through a cable 18 and each strip electrode 13 and 13 are connected (shortened) by a strip conductor 19 having an approximately same width as that of the strip electrode 13.