| 摘要 |
PROBLEM TO BE SOLVED: To remove the overhung part of a physical vapor deposited film. SOLUTION: In order to remove the overhung part of the physical vapor deposited film, after liner/barrier/seed (110, 112 and 214) deposition, sputter etching is conducted. Physical vapor deposited film(PVD) process generally generates liner/barrier layers (110 and 214) or a seed layer (112) having a thick overhung part (111) at the upper corner of a trench (108), a via (106) or a contact (212). After the deposition, sputter etching is performed by using a low bias, the thickness of the overhung part (111) is reduced and a seam generated in subsequent important processes is avoided.
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