MANUFACTURING METHOD AND DEVICE OF SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method and a device for easily manufacturing a thin film by continuously generating uniform glow discharge plasma under pressure near atmospheric pressure for performing glow discharge plasma treatment stably at manufacturing the thin film in a manufacturing process of a semiconductor element. SOLUTION: Feed gas is introduced between counter electrodes under pressure near atmospheric pressure in a laminate formation process of the semiconductor element, and a pulsive electric field is applied between counter electrodes for changing the feed gas into the glow discharge plasma and for forming the thin film in the manufacturing method of the semiconductor element.