| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a charged particle beam deflector allowing the generation of a uniform electric field and the correction of the track of a secondary beam while minimizing the distortion of an image to be formed on a detection plane, and a charged particle beam defect inspection device and method using the same. SOLUTION: The beam deflector A comprises eight electrodes 71-78 arranged at equal spaces on a circumference in such a manner that an angleαmade between two adjacent electrodes from a circumferential center O is equal to an angleβmade between the electrodes from the circumferential center O, power supplies 71a-78a for applying voltage to the electrodes 71-78 and a bema deflector control part 79 for controlling the power supplies 71a-78a. A deflection field generation control system 79a, a first uniform field generation control system 79b and a second uniform field generation control system 79c are used for controlling values for voltage to be distributed to the electrodes 71-78 to make an electric field to be generated in the circumference uniform.</p> |
