APPARATUS FOR DEPOSITING SEMICONDUCTOR MATERIAL, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON ROD AND USE OF CARBON ELECTRODE FOR THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for depositing a semiconductor material on a heated support. SOLUTION: In the apparatus for depositing a semiconductor material on a heated support in which an electric current passage electrically conductive to and fixed to the substrate of the apparatus and an electrode holder are provided, this electrode holder has an under surface disposed on the electric current passage and a top surface connected to a carbon electrode, and the support can be mounted in the carbon electrode, the carbon electrode has >145 W/m.K heat conductivity and a coefficient of thermal expansion matching that of silicon.