发明名称 INDIUM/GALLIUM NITRIDE AND METHOD FOR GROWING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide InGaN of which quality and superior crystallinity. SOLUTION: The method for growing an indium/gallium semiconductor nitride semiconductor by organic metal vapor-phase growth grows the indium/gallium semiconductor nitride semiconductor, expressed by the general formula InXGa1-XN (0<X<5), doped with a P-type impurity on a gallium nitride layer at a growing temperature of higher than 600 deg.C by using the gas of gallium source, the gas of indium source, the gas of nitrogen source and gas which includes the P-type impurity.
申请公布号 JP2002237658(A) 申请公布日期 2002.08.23
申请号 JP20010375704 申请日期 2001.12.10
申请人 NICHIA CHEM IND LTD 发明人 NAKAMURA SHUJI;MUKAI TAKASHI
分类号 H01L21/205;H01L33/32;H01S5/323 主分类号 H01L21/205
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