| 摘要 |
The present invention relates to an improved structure of the "showerhead" used to introduce gaseous source material into a vapor deposition reactor such as a metal-organic chemical vapor deposition (MOCVD) reactor. The showerhead (20) includes inlet seal assemblies (22) that connect the inlet lines (25) to the showerhead through the use of opposing planar seal faces (26, 28) so as to simplify the process of connecting and disconnecting the inlet lines to the showerhead. In addition, the showerhead includes a gas dispersion assembly (40) on the inner face of the showerhead that optimises the flow of gaseous material into the reaction chamber. The gas dispersion assembly includes a plurality of webbed disks (41-43) that define discrete dispersion chambers (49a, 49b, 49c). The webbed disks include integrally-formed flow diverters (54) that direct the flow of gas so as to create controlled, uniform flow of material into the reaction chamber. |
