| 发明名称 |
Amine compounds, resist compositions and patterning process |
| 摘要 |
Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
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| 申请公布号 |
US2002115018(A1) |
申请公布日期 |
2002.08.22 |
| 申请号 |
US20010003288 |
申请日期 |
2001.12.06 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;KOBAYASHI TOMOHIRO;WATANABE TAKERU |
| 分类号 |
C07C255/14;C07C255/24;C07D295/15;C07D307/14;G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03F7/038;G03F7/38 |
主分类号 |
C07C255/14 |
| 代理机构 |
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代理人 |
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