发明名称 UV RESISTANT RESIN FOR PARAFFINIC SOLVENT BASED PAINT
摘要 <p>This invention discloses a resin which is particularly useful in making paraffinic solvent based paints, said resin being comprised of repeat units which are derived from: (a) about 5 to about 60 weight percent tertiary-butyl cyclohexyl methacrylate; (b) 0 to about 40 weight percent vinyl aromatic monomers; (c) about 20 to about 80 weight percent alkyl methacrylate monomers; and (d) about 1 to about 30 weight percent alkyl acrylate monomers. These resins exhibit good hardness and excellent resistance to ultraviolet light. More importantly, coating made with these resins are highly resistant to yellowing and discoloration on exposure to ultra-violet light over long periods of time. The subject invention further discloses a paint formulation which is comprised of: (a) a paraffinic solvent; (b) a resin which is comprised of repeat units which are derived from: (i) about 5 to about 60 weight percent tertiary-butyl cyclohexyl methacrylate; (ii) 0 to about 40 weight perecent vinyl aromatic monomers; (iii) about 20 to about 80 weight percent alkyl methacrylate monomers; and (iv) about 1 to about 30 weight percent alkyl acrylate monomers; and (c) one or more pigments.</p>
申请公布号 WO2002064650(A2) 申请公布日期 2002.08.22
申请号 IB2002001610 申请日期 2002.02.13
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