| 摘要 |
The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with SU-8, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in SU-8 microstructures that have aspect ratios of 8:1.
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