| 发明名称 |
FLUORINATED PHENOLIC POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME |
| 摘要 |
The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention contain a polymer that has fluorinated phenolic units and photoacid-labile groups. Resists of the invention can be effectively imaged at short wavelengths such as sub-200 nm, particularly 157 nm. |
| 申请公布号 |
WO0221212(A3) |
申请公布日期 |
2002.08.22 |
| 申请号 |
WO2001US28184 |
申请日期 |
2001.09.08 |
| 申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
KLAUCK-JACOBS, AXEL;ZAMPINI, ANTHONY;CHO, SUNGSEO;YAMADA, SHINTARO |
| 分类号 |
G03F7/004;G03F7/038;G03F7/039 |
主分类号 |
G03F7/004 |
| 代理机构 |
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