发明名称 GLÄTTUNGSFILM AUS NOVOLACPOLYMER FÜR MIKROELEKTRONISCHE STRUKTUREN
摘要 <p>An improved method for forming planarization films which remain adhered to substrates upon exposure to heat comprising first applying a polymeric solution containing a low molecular weight novolac resin, a surfactant selected from the group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.</p>
申请公布号 DE69525157(T2) 申请公布日期 2002.08.22
申请号 DE1995625157T 申请日期 1995.07.05
申请人 HONEYWELL INTERNATIONAL INC., MORRISTOWN 发明人 DRAGE, STEVEN
分类号 C08G8/10;C08G8/00;C08L61/06;C09D161/04;C09D161/06;H01L21/312;(IPC1-7):H01L21/00 主分类号 C08G8/10
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