发明名称 |
Correcting device, exposure apparatus, device production method, and device produced by the device production method |
摘要 |
A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first area and a second area. The first area is formed above a reticle having formed thereon a pattern that is projected onto a material to be processed in order to form an image of the pattern on the material to be processed. The second area is connected to the first area, has a cross-sectional area that is different from that of the first area, and is not disposed in line with the reticle. The correcting device also includes a blowing section that blows gas to the gas flow path.
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申请公布号 |
US2002112784(A1) |
申请公布日期 |
2002.08.22 |
申请号 |
US20010011210 |
申请日期 |
2001.12.11 |
申请人 |
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发明人 |
TANAKA NOBUYOSHI;SAKAMOTO EIJI |
分类号 |
G03F7/20;H01L21/027;H01L21/68;(IPC1-7):C23C8/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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