| 摘要 |
<p>In one illustrative embodiment, a method is provided to controllably expose a layer of photoresist (23) to a light source (40). In particular, the duration of time that the light source (40) is exposed to a layer of photoresist (23) is controlled as a function of optical parameters of the light source (40). In one illustrative embodiment, the method is comprised of energizing a light source (40) and determining an optical parameter of the light source (40). A desired photodose is determined based upon the optical parameters of the light source (40), and the layer of photoresist (23) is exposed to the light source (40) for a duration of time to provide the desired photodose.</p> |
