MASK HAVING OPTICAL PROXIMITY CORRECTION PATTERN

摘要

PURPOSE: A mask having an optical proximity correction pattern is provided to restrain a line shortening, an edge rounding and bridge phenomena by using a line pattern for the optical proximity correction. CONSTITUTION: A mask having an optical proximity correction pattern comprises a transparent substrate, a first light-shielding pattern(104) including a first vertical plane having a constant side on the transparent substrate, a second light-shielding pattern(108), and a bar-type line pattern(402). The second light-shielding pattern(108) further includes a second vertical plane corresponding to the first vertical plane and spaced apart from the first vertical plane of the first light-shielding pattern(104). The bar-type line pattern(402) is formed on the second vertical plane.