发明名称 LIQUID DROP JET RECORDER AND METHOD FOR MANUFACTURING SILICON STRUCTURE
摘要 PURPOSE: To provide a liquid drop jet apparatus which is equipped with liquid discharge openings having different depths in the same chip. CONSTITUTION: Large ink discharge openings 20 and small ink discharge openings 22 having different depths are formed to a layer end face 18 of an ink jet recording head 10. First, parts corresponding to the large ink discharge openings 20 are formed by wet anisotropic etching into grooves having a triangular section. Then, reactive ion etching(RIE) is carried out to parts corresponding to the large ink discharge openings 20 and the small ink discharge openings 22, whereby a channel substrate 14 including the large ink discharge openings 20 and the small ink discharge openings 22 is formed. The ink jet recording head 10 is manufactured in this manner. Eventually, channels can be worked accurately by the RIE and grooves having different depths can be efficiently formed by the wet anisotropic etching. The productivity of the ink jet recording head 10 is also improved.
申请公布号 KR20020066972(A) 申请公布日期 2002.08.21
申请号 KR20020006427 申请日期 2002.02.05
申请人 FUJI XEROX CO., LTD. 发明人 MURATA MICHIAKI;UEDA YOSHIHISA
分类号 B41J2/135;B41J2/04;B41J2/05;B41J2/14;B41J2/16;B41J2/205;H01L21/3065;(IPC1-7):B41J2/05 主分类号 B41J2/135
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