发明名称 |
SEMICONDUCTOR DEVICE HAVING SPACER MADE OF MULTI-LAYER AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A semiconductor device having spacers made of a multi-layer is provided to reduce a short channel effect, to reduce a threshold voltage change and to improve a refresh characteristic by reducing a heat budget processing. CONSTITUTION: A plurality of gate electrodes(108) are formed on a semiconductor substrate(100). Gate poly oxides(109a) are formed at a desired portion of both sidewalls of the gate electrodes(108) and connected with a predetermined portion of the semiconductor substrate(100). A silicon nitride(110b) is formed at a desired portion of both sidewalls of the gate electrodes(108) and contacted to the gate poly oxides(109a). An oxide layer(112a) is contacted with the silicon nitride(110b) and out-most spacers(114a) are contacted with the oxides(112a).
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申请公布号 |
KR20020066668(A) |
申请公布日期 |
2002.08.21 |
申请号 |
KR20010006983 |
申请日期 |
2001.02.13 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JAE GU |
分类号 |
H01L21/28;H01L21/336;H01L21/60;H01L21/768;H01L21/8242;H01L27/108;H01L29/417;H01L29/78;(IPC1-7):H01L27/108 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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