| 摘要 |
<p>In a pattern of a transfer mask to transfer a transfer pattern to a substrate to be transferred by the use of energy beams, the transfer mask being made by forming an aperture pattern in a thin film portion supported by a supporting frame portion, when the transfer pattern includes a shielding pattern in which one part is connected to at least the periphery of the transfer mask, a shielding pattern portion, where the ratio of the surface area of the pattern surface portion on the transfer mask to a sectional area of a supporting portion is larger than 5000, is split and developed. <IMAGE></p> |
