| 发明名称 |
Aberration measuring method, aberration measuring system and aberration measuring mask |
| 摘要 |
A plurality of bars-in-bars marks are formed. Each mark has four small patterns and four large patterns arranged in a direction of a straight line and a direction perpendicular thereto. The straight lines of the respective bars-in-bars marks are disposed at angles of 0°, 30° and 60°.
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| 申请公布号 |
US6437858(B1) |
申请公布日期 |
2002.08.20 |
| 申请号 |
US20000667818 |
申请日期 |
2000.09.22 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KOUNO TAKUYA;NOMURA HIROSHI;HIGASHIKI TATSUHIKO |
| 分类号 |
H01L21/027;G01M11/02;G03F7/20;(IPC1-7):G01B9/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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