发明名称 Microstructure array, and apparatus and method for forming the microstructure array, and a mold for fabricating a microstructure array
摘要 A fabrication method of fabricating an array of microstructures is provided. The method includes the step of preparing a substrate with a surface including a usable region and a dummy region continuously set around the usable region, at least the usable region and the dummy region of the substrate are electrically conductive and have a conductive portion. The method also includes the steps of forming a first insulating layer on the conductive portion, and forming a plurality of openings in the first insulating layer, the openings being arranged in a predetermined array pattern. Additionally, the method includes the step of performing one of electroplating and electrodeposition using the conductive portion as an electrode to form a first plated or electrodeposited layer in the openings and on the first insulating layer in both the usable region and the dummy region.
申请公布号 US6436265(B1) 申请公布日期 2002.08.20
申请号 US20000534341 申请日期 2000.03.24
申请人 CANON KABUSHIKI KAISHA 发明人 SHIMADA YASUHIRO;YAGI TAKAYUKI;TESHIMA TAKAYUKI;USHIJIMA TAKASHI
分类号 G02B1/00;G02B3/00;(IPC1-7):C25D5/02 主分类号 G02B1/00
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