发明名称 |
Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same |
摘要 |
An optical system that controls laser beam spot profile for forming a high performance thin film by a laser heat treatment process is provided. In the optical system that irradiates a rectangular laser beam on a film formed on a substrate, intensity distribution forming, apparatus makes the intensity distribution uniform in the longitudinal direction while maintaining the properties of the laser beam 2 such as directivity in the direction of shorter side, making it possible to concentrate the light to a limit permitted by the nature of the laser beam and achieve the maximum intensity gradient on the film disposed on the substrate. Thus a steep temperature distribution can be generated on the film disposed on the substrate and, as a result, high performance thin film can be formed.
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申请公布号 |
US6437284(B1) |
申请公布日期 |
2002.08.20 |
申请号 |
US20000599645 |
申请日期 |
2000.06.23 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
OKAMOTO TATSUKI;OGAWA TETSUYA;FURUTA KEISUKE;TOKIOKA HIDETADA;SASAGAWA TOMOHIRO;NISHIMAE JUNICHI;INOUE MITSUO;SATO YUKIO |
分类号 |
B23K26/06;B23K26/073;H01L21/20;H01L21/268;H01L21/324;(IPC1-7):B23K26/06 |
主分类号 |
B23K26/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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