发明名称 |
Solution for forming nickel metal thin film and method of forming nickel metal thin film using the said solution |
摘要 |
Disclosed is a method of forming a nickel metal thin film, comprising the steps of coating a substrate with a solution for forming a nickel metal thin film, the solution being formed of an alcohol solution containing nickel ions and a reducible chelate type ligand having a hydrazone unit so as to form a gel film, and subjecting the resultant gel film to a heat treatment under an inert gas atmosphere.
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申请公布号 |
US6436479(B2) |
申请公布日期 |
2002.08.20 |
申请号 |
US20000734603 |
申请日期 |
2000.12.13 |
申请人 |
PRESIDENT OF GIFU UNIVERSITY |
发明人 |
TAKAHASHI YASUTAKA;OHYA YUTAKA;BAN TAKAYUKI |
分类号 |
C23C18/08;C23C18/34;(IPC1-7):B05D3/12;B05D1/18;B05D3/02;C09D5/00 |
主分类号 |
C23C18/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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