发明名称 Solution for forming nickel metal thin film and method of forming nickel metal thin film using the said solution
摘要 Disclosed is a method of forming a nickel metal thin film, comprising the steps of coating a substrate with a solution for forming a nickel metal thin film, the solution being formed of an alcohol solution containing nickel ions and a reducible chelate type ligand having a hydrazone unit so as to form a gel film, and subjecting the resultant gel film to a heat treatment under an inert gas atmosphere.
申请公布号 US6436479(B2) 申请公布日期 2002.08.20
申请号 US20000734603 申请日期 2000.12.13
申请人 PRESIDENT OF GIFU UNIVERSITY 发明人 TAKAHASHI YASUTAKA;OHYA YUTAKA;BAN TAKAYUKI
分类号 C23C18/08;C23C18/34;(IPC1-7):B05D3/12;B05D1/18;B05D3/02;C09D5/00 主分类号 C23C18/08
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