发明名称 Semiconductor device
摘要 A number of npn and pnp bipolar transistors are formed in a single chip of silicon, so that some of the transistors have a greater frequency response than others The higher frequency transistors have their emitters located closer to the collectors, by positioning a collector, or emitter, of a transistor in a recessed portion of the surface of the chip. The recess is formed in an accurate and controlled manner by locally oxidising the silicon surface, and subsequently removing the oxide to leave the recess.
申请公布号 US6436780(B1) 申请公布日期 2002.08.20
申请号 US20000675957 申请日期 2000.09.29
申请人 MITEL SEMICONDUCTOR LIMITED 发明人 OSBORNE PETER H;WILSON MARTIN C
分类号 H01L21/8228;H01L27/082;(IPC1-7):H01L21/822 主分类号 H01L21/8228
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