| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid treatment apparatus provided with a transportation mechanism, in which a substrate is surely held in transporting the substrate and the generation of transfer in the substrate is suppressed. SOLUTION: A resist coating/development system 100, which is one of operation forms of the liquid treatment apparatus, possesses a resist coating system (CT) for forming a resist film on the substrate G 22, a peripheral resist removing unit (ER) 23 for removing the resist in the peripheral part of the substrate G and a transporting structure 50 for transporting the substrate G between 2 units. A suction structure 73 and a supporting pin 74 are arranged in transporting arms 51a and 51b constituting the transporting structure 50 to hold the substrate G. |
