发明名称 Fluid nozzle system and method in an emitted energy system for photolithography
摘要 An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118).
申请公布号 US6437349(B1) 申请公布日期 2002.08.20
申请号 US20000598664 申请日期 2000.06.20
申请人 ADVANCED ENERGY SYSTEMS, INC. 发明人 HAAS EDWIN G.;GUTOWSKI ROBERT M.;CALIA VINCENT S.
分类号 B05B1/00;G03F7/20;H05G2/00;(IPC1-7):H05H1/34 主分类号 B05B1/00
代理机构 代理人
主权项
地址