| 摘要 |
A device for exposing and heating a substrate coated with resist includes an exposure tool for selectively exposing the resist, and a heater for heating the exposed resist, the exposure tool and the heater able to simultaneously act on different portions of the resist. A method of patterning resist on a substrate includes the steps of selectively exposing the resist on the first portion of the substrate, heating the resist on the first portion, and simultaneously or thereafter selectively exposing the resist on a second portion of the substrate. In an exemplary embodiment the exposure tool is an electron beam generator for exposing a chemically-amplified resist, and the heater is a light source such as a laser light source which does not appreciably expose the resist. The device and method allow a post-exposure heating with a smaller delay between the exposure and the heating than with conventional methods, which involve exposing a reticle and mask completely before heating by baking.
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