| 摘要 |
An exposure apparatus for illuminating a mask pattern and transferring the image of the pattern onto a photosensitive substrate comprises a chamber which houses an exposure unit, an air-conditioner for adjusting the atmosphere in the chamber to a constant condition, a drain for draining condensate produced in the air-conditioner, trapping system for temporarily trapping the condensate before draining it, and a liquid supply system for supplying clean liquid to the trapping system. A U-tube or a solenoid valve is provided at a midway position of a drain pipe for the trapping system to prevent the entry of impurities from the outside into the apparatus. Otherwise, impurities may be prevented from entering by interposing a waterproof filter between the air-conditioner and drain to remove impurities in the condensate produced in the air-conditioner.
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