| 发明名称 |
Electron source fabricating method and an image forming apparatus fabricating method |
| 摘要 |
An electron-emitting device comprises a pair of electrodes and an electroconductive thin film therebetween having an electron-emitting region. The electroconductive thin film is coated with an additional film at the electron-emitting region to provide an additional resistance within a range from 500OMEGA to 100 kOMEGA.
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| 申请公布号 |
US6435928(B1) |
申请公布日期 |
2002.08.20 |
| 申请号 |
US20000633152 |
申请日期 |
2000.08.04 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TSUKAMOTO TAKEO |
| 分类号 |
H01J9/02;H01J1/316;H01J29/04;H01J31/12;(IPC1-7):H01J9/02 |
主分类号 |
H01J9/02 |
| 代理机构 |
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