FINE LINE FORMING METHOD AND EQUIPMENT THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a method and equipment for forming fine lines free from contamination, simply and at a low cost. SOLUTION: By irradiating various kinds of material 9 for lines such as metal, insulator and semiconductor arranged in a vacuum with laser, ultrafine particles of the material are formed. The particles are jetted toward a substrate 18 from a nozzle 21. By giving relative movement between the nozzle and the substrate, the fine lines are formed directly. The substrate is arranged in an atmosphere whose degree of vacuum is higher than that of the vacuum atmosphere where the ultrafine particles are formed. The ultrafine particles are carried with a carrying tube, and jetted against the substrate surface from the nozzle installed in the tip of the carrying tube.