| 摘要 |
PROBLEM TO BE SOLVED: To uniformly cause dispersion a process gas in a vacuum chamber for eliminating thickness nonuniformity of a film formed on a substrate, thereby forming a proper film. SOLUTION: The shower head for introducing a gas is disposed in a vacuum chamber of a plasma CVD apparatus and is provided with a plasma generating electrode, which is covered with a ceramic porous coat having a porosity of 38% or more and an Al2O3 content of 99.0 wt.% or more. |
