| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processor capable of efficiently cooling a planar antenna member, without giving adverse influences on microwave propagation. SOLUTION: The processor comprises an evacuated process chamber 22 which is opened at the ceiling, an insulation board 66 hermetically mounted in the ceiling opening of the processing chamber 22, a mount 24 disposed in the processing chamber for mounting a work W, a planar antenna member 70 disposed above the insulation board for introducing microwaves for generating a plasma from a plurality of microwave radiation holes 88 formed at prescribed pitches through the insulation board, a delayed-wave member 72 disposed above the planar antenna member for reducing the wavelength of the microwave and gas feed means 38, 40 for introducing prescribed gases in the process chamber. A thermal medium passage 90 for pouring a thermal medium is formed in the planar antenna member to effectively cool this member, without giving adverse influences to the microwave propagation. |
