| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and method for writing a pattern, by which a pattern can be written by arbitrarily weighing field-connecting accuracy and in-field accuracy, in an exposure process based on multiple exposures. SOLUTION: When double exposure is performed, a writing region 50 is divided into smaller fields and a pattern is written with an exposure of 2/3D (where D is the total exposure amount) at the performing of the first exposure. At the performing of the second exposure, the region 50 is divided into fields of larger sizes which are larger than the fields divided for the first exposure, as shown in Fig. 2(B), and the exposure is performed with an exposure of 1/2D.
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